Self-Etch Adhesive Systems: A Literature Review

This paper presents the state of the art of self-etch adhesive systems. Four topics are shown in this review and included: the historic of this category of bonding agents, bonding mechanism, characteristics/properties and the formation of acid-base resistant zone at enamel/dentin-adhesive interfaces. Also, advantages regarding etch-and-rinse systems and classifications of self-etch adhesive systems according to the number of steps and acidity are addressed. Finally, issues like the potential durability and clinical importance are discussed. Self-etch adhesive systems are promising materials because they are easy to use, bond chemically to tooth structure and maintain the dentin hydroxyapatite, which is important for the durability of the bonding.

Self-etch adhesive systems; adhesion; dentin.

Authorship

Marcelo Giannini

Operative Dentistry Division, Department of Restorative Dentistry, Piracicaba Dental School, UNICAMP - University of Campinas, Piracicaba, Brazil UNICAMP - University of CampinasBrazilPiracicaba, BrazilOperative Dentistry Division, Department of Restorative Dentistry, Piracicaba Dental School, UNICAMP - University of Campinas, Piracicaba, Brazil

Patrícia Makishi

Dental Materials Division, Department of Restorative Dentistry, Piracicaba Dental School, UNICAMP - University of Campinas, Piracicaba, Brazil UNICAMP - University of CampinasBrazilPiracicaba, BrazilDental Materials Division, Department of Restorative Dentistry, Piracicaba Dental School, UNICAMP - University of Campinas, Piracicaba, Brazil

Ana Paula Almeida Ayres

Paulo Moreira Vermelho

Bruna Marin Fronza

Toru Nikaido

Division of Oral Health Sciences, Department of Cariology and Operative Dentistry, Tokyo Medical and Dental University. Tokyo, Japan Tokyo Medical and Dental UniversityJapanTokyo, JapanDivision of Oral Health Sciences, Department of Cariology and Operative Dentistry, Tokyo Medical and Dental University. Tokyo, Japan

Junji Tagami

SCIMAGO INSTITUTIONS RANKINGS

Figures

Figures (10)

Thumbnail

Figure 1
SEM micrographs of the resin-dentin interface bonded with the one-step self-etch mode (Fig. 1A) and etch-mode (Fig. 1B) Scotchbond Universal adhesive. Figure 1A shows a thin hybridized layer (*) and few/short resin tags (arrow). Figure 1B shows that thickness of dentin hybridized layer (*) was approximately 3.0 to 4.0 mm (AL: adhesive layer, CR: composite resin, arrows: indicate resin tags, 1,000× magnification).

Thumbnail

Figure 2.
TEM micrograph of the resin-dentin interface bonded with the one-step self-etch adhesive Futura Bond NR. Thickness of hybridized layer (HL) was approximately 1.2 mm (AL: adhesive layer, D: dentin, DT: dentin tubule, 7,000× magnification).

Thumbnail

Figure 3.
TEM micrograph of the resin-dentin interface bonded with the etch-mode of Scotchbond Universal. The thickness of hybrid layer (HL) formed after phosphoric acid etching and adhesive application was approximately 4 mm (AL: adhesive layer, D: dentin, TD: dentin tubule, 10,000× magnification).

Thumbnail

Figure 4.
TEM micrographs of the resin-dentin interface bonded with the two-step self-etch primer Clearfil SE Bond. The high magnification showed that the thickness of interaction zone (HL) was less than 1.0 mm (AL: adhesive layer, D: dentin, DT: dentin tubule, 3,000 x and 30,000× magnification, respectively).

Thumbnail

Figure 5
SEM micrographs of the resin-enamel interface bonded with the one-step self-etch mode adhesive Scotchbond Universal (Fig. 5A). Asterisks show the bonded area. The Figure 5B is a SEM micrograph of the resin-enamel interface bonded with the three-step etch-and-rinse adhesive Optibond FL. Arrows show resin tags and the bonded area (CR: composite resin, AL: adhesive layer, E: enamel, 1,000× magnification).

Thumbnail

Figure 6.
SEM image of the dentin-adhesive interface after acid-base challenge. The acid-base resistant zone (ABRZ) was observed beneath the hybrid layer in a two-step self-etch adhesive system (5,000× magnification).

Thumbnail

Figure 7.
Schematic summary of the results of acid-base challenge, where: For no treatment on dentin, no hybrid layer formation was observed, but wall lesion was found. Wall lesion formation suggested that the interface could not resist acid-base challenge, hence causing secondary caries formation in clinical situations. For acid-etching systems, a hybrid layer was observed, but the acid-base resistant zone and wall lesion were not detected. For self-etch systems, a hybrid layer was observed and the acid-base resistant zone was observed beneath the hybrid layer, which was along the dentin-adhesive interface.

Thumbnail

Figure 8.
TEM image of the dentin-adhesive interface after acid-base challenge. The TEM/SAED evidence demonstrated that the ABRZ contained densely arranged apatite crystallites (5,000× magnification).

Thumbnail

Figure 9.
SEM images of the enamel-adhesive interfaces after acid-base challenge. The formation of enamel ABRZ with a two-step self-etch adhesive system, which contains MDP as the acidic functional monomer (left), while the enamel ABRZ could not be distinguished at the most parts of the corresponding region in the Phenyl-P-containing adhesive. And a funnel-shaped erosion area was noted at the junction of ABRZ in this group, indicating a weak area vulnerable to acid-base attack beneath the bonding interface (2,000× magnification).

Thumbnail

Figure 10.
SEM image of the dentin ABRZ after long-term durability test. A delta-shaped region of dentin ABRZ was formed from the upper slope to the end of outer lesion when the fluoride-releasing two-step self-etch adhesive system; Clearfil Protect Bond. The interface created by the fluoride-releasing adhesive was more stable than that of a similar fluoride-free adhesive after 3-month immersion in distilled water (3,500× magnification).

Figure 1 SEM micrographs of the resin-dentin interface bonded with the one-step self-etch mode (Fig. 1A) and etch-mode (Fig. 1B) Scotchbond Universal adhesive. Figure 1A shows a thin hybridized layer () and few/short resin tags (arrow). Figure 1B shows that thickness of dentin hybridized layer () was approximately 3.0 to 4.0 mm (AL: adhesive layer, CR: composite resin, arrows: indicate resin tags, 1,000× magnification).

Figure 2. TEM micrograph of the resin-dentin interface bonded with the one-step self-etch adhesive Futura Bond NR. Thickness of hybridized layer (HL) was approximately 1.2 mm (AL: adhesive layer, D: dentin, DT: dentin tubule, 7,000× magnification).

Figure 3. TEM micrograph of the resin-dentin interface bonded with the etch-mode of Scotchbond Universal. The thickness of hybrid layer (HL) formed after phosphoric acid etching and adhesive application was approximately 4 mm (AL: adhesive layer, D: dentin, TD: dentin tubule, 10,000× magnification).

Figure 4. TEM micrographs of the resin-dentin interface bonded with the two-step self-etch primer Clearfil SE Bond. The high magnification showed that the thickness of interaction zone (HL) was less than 1.0 mm (AL: adhesive layer, D: dentin, DT: dentin tubule, 3,000 x and 30,000× magnification, respectively).

Figure 5 SEM micrographs of the resin-enamel interface bonded with the one-step self-etch mode adhesive Scotchbond Universal (Fig. 5A). Asterisks show the bonded area. The Figure 5B is a SEM micrograph of the resin-enamel interface bonded with the three-step etch-and-rinse adhesive Optibond FL. Arrows show resin tags and the bonded area (CR: composite resin, AL: adhesive layer, E: enamel, 1,000× magnification).

Figure 6. SEM image of the dentin-adhesive interface after acid-base challenge. The acid-base resistant zone (ABRZ) was observed beneath the hybrid layer in a two-step self-etch adhesive system (5,000× magnification).

Figure 7. Schematic summary of the results of acid-base challenge, where: For no treatment on dentin, no hybrid layer formation was observed, but wall lesion was found. Wall lesion formation suggested that the interface could not resist acid-base challenge, hence causing secondary caries formation in clinical situations. For acid-etching systems, a hybrid layer was observed, but the acid-base resistant zone and wall lesion were not detected. For self-etch systems, a hybrid layer was observed and the acid-base resistant zone was observed beneath the hybrid layer, which was along the dentin-adhesive interface.

Figure 8. TEM image of the dentin-adhesive interface after acid-base challenge. The TEM/SAED evidence demonstrated that the ABRZ contained densely arranged apatite crystallites (5,000× magnification).

Figure 9. SEM images of the enamel-adhesive interfaces after acid-base challenge. The formation of enamel ABRZ with a two-step self-etch adhesive system, which contains MDP as the acidic functional monomer (left), while the enamel ABRZ could not be distinguished at the most parts of the corresponding region in the Phenyl-P-containing adhesive. And a funnel-shaped erosion area was noted at the junction of ABRZ in this group, indicating a weak area vulnerable to acid-base attack beneath the bonding interface (2,000× magnification).

Figure 10. SEM image of the dentin ABRZ after long-term durability test. A delta-shaped region of dentin ABRZ was formed from the upper slope to the end of outer lesion when the fluoride-releasing two-step self-etch adhesive system; Clearfil Protect Bond. The interface created by the fluoride-releasing adhesive was more stable than that of a similar fluoride-free adhesive after 3-month immersion in distilled water (3,500× magnification).

How to cite

copy

Fundação Odontológica de Ribeirão Preto Av. do Café, S/N, 14040-904 Ribeirão Preto SP Brasil, Tel.: (55 16) 3602-3982, Fax: (55 16) 3633-0999 - Ribeirão Preto - SP - Brazil
E-mail: bdj@forp.usp.br

Acompanhe os números deste periódico no seu leitor de RSS

Versão para download de PDF

PDF

Inglês

Versões e tradução automática

Versão original do texto

English

Tradução automática

Google Translator
Microsoft Translator

Como citar

RIS

BIBTEX

Outros formatos de citação e exportação:

SciELO - Scientific Electronic Library Online
Rua Dr. Diogo de Faria, 1087 – 9º andar – Vila Clementino 04037-003 São Paulo/SP - Brasil
E-mail: scielo@scielo.org

Leia a Declaração de Acesso Aberto

Métricas

Self-Etch Adhesive Systems: A Literature Review

PlumX